Light emitting diode having a plurality of light emitting units

ABSTRACT

A light emitting diode includes a substrate including a concave-convex pattern having concave portions and convex portions, a first light emitting unit disposed on the substrate, a second light emitting unit disposed on the substrate, a first wire connecting the first light emitting unit to the second light emitting unit over the concave-convex pattern, and an insulation layer disposed between the concave-convex pattern and the wire. The insulation layer has a shape corresponding to the concave-convex pattern.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. patent application Ser. No.14/087,140, filed on Nov. 22, 2013 and claims priority from and thebenefit of Korean Patent Application Nos. 10-2012-0133564, filed on Nov.23, 2012, and 10-2012-0155482, filed on Dec. 27, 2012, all of which arehereby incorporated by reference for all purposes as if fully set forthherein.

BACKGROUND

1. Field

Exemplary embodiments of the present invention relate to a lightemitting diode and, more particularly, to a light emitting diode havinga plurality of light emitting units.

2. Discussion of the Background

Light emitting diodes are widely used for display devices and backlightunits. With low power consumption and long lifespan as compared withexisting incandescent lamps or fluorescent lamps, light emitting diodeshave expanded application ranges to general lighting by replacingexisting incandescent lamps, fluorescent lamps, and the like.

A light emitting diode may be driven by forward current and thus repeatson/off operation according to a direction of electric current providedunder an alternating current (AC) source. Thus, when the light emittingdiode is directly connected to the AC source, the light emitting diodemay not continuously emit light and may be easily damaged by reversecurrent. Moreover, a single light emitting diode may be driven by apredetermined forward voltage and thus may not be driven under highvoltage conditions.

A light emitting diode capable of being driven under high voltage ACconditions has been developed. Such a light emitting diode may include aplurality of light emitting units having a substantially square orrectangular shape and connected to one another in series byinterconnection wires, and thus, the light emitting diode may be drivenby high voltage. Further, a serial array of light emitting units may beconnected to a rectifier circuit such as a bridge rectifier, therebyproviding a light emitting diode which may be driven by an AC source.

However, a typical light emitting diode having a plurality of lightemitting units may have relatively low luminous efficacy.

Korean Patent Publication No. 2011-0024762A discloses a technique forimproving light extraction efficiency, in which a convex-concave patternis formed on a substrate as in a patterned sapphire substrate (PSS),such that semiconductor layers may be grown on the convex-concavepattern. However, this technique has a limit in improving lightextraction efficiency only through formation of the convex-concavepattern.

The above information disclosed in this Background section is only forenhancement of understanding of the background of the invention andtherefore it may contain information that does not form any part of theprior art nor what the prior art may suggest to a person of ordinaryskill in the art.

SUMMARY OF THE INVENTION

Exemplary embodiments of the present invention provide a light emittingdiode having improved light extraction efficiency.

Exemplary embodiments of the present invention also provide a lightemitting diode including a plurality of light emitting units and havingimproved light extraction efficiency.

Exemplary embodiments of the present invention also provide a lightemitting diode capable of reducing optical loss caused by components ofthe light emitting diode.

Additional features of the invention will be set forth in thedescription which follows, and in part will be apparent from thedescription, or may be learned by practice of the invention.

An exemplary embodiment discloses a light emitting diode that includes asubstrate including a concave-convex pattern having concave portions andconvex portions, a first light emitting unit disposed on the substrate,a second light emitting unit disposed on the substrate, a first wireconnecting the first light emitting unit to the second light emittingunit over the concave-convex pattern of the substrate, and an insulationlayer disposed between the concave-convex pattern of the substrate andthe wire. The insulation layer has shape corresponding to theconcave-convex pattern.

It is to be understood that both the foregoing general description andthe following detailed description are exemplary and explanatory and areintended to provide further explanation of the invention as claimed.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other aspects, features, and advantages of the presentinvention will become apparent from the detailed description of thefollowing exemplary embodiments in conjunction with the accompanyingdrawings.

FIG. 1 is a schematic plan view of a light emitting diode according toan exemplary embodiment of the present invention.

FIG. 2 is a sectional view, taken along line I-I′, of the light emittingdiode according to the exemplary embodiment of FIG. 1.

FIG. 3 is a schematic plan view of a parallelogram-shaped light emittingunit.

FIG. 4 is a schematic plan view of a light emitting diode according toan exemplary embodiment of the present invention.

FIG. 5 is a sectional view, taken along line I-I′, of the light emittingdiode according to the exemplary embodiment of FIG. 4.

FIG. 6A and FIG. 6B are schematic plan views of a light emitting diodeaccording to exemplary embodiments of the present invention.

FIG. 7A, FIG. 7B, FIG. 7C, FIG. 7D, FIG. 7E, FIG. 7F, FIG. 7G, FIG. 7H,FIG. 7I, and FIG. 7J are sectional views illustrating a method offabricating a light emitting diode according to an exemplary embodimentof the present invention.

FIG. 8, FIG. 9, and FIG. 10 are schematic plan views of mask patternsfor etching.

FIG. 11 is a plan view of a convex-concave pattern according to anexemplary embodiment of the present invention.

FIG. 12 is a perspective view of one convex-concave pattern shown inFIG. 11.

FIG. 13A and FIG. 13B are diagrams illustrating reflection of lightemitted from an active layer in various directions by a convex-concavepattern formed at a lower portion of a light emitting diode and aconvex-concave pattern within an isolation region, respectively.

FIG. 14A, FIG. 14B, FIG. 14C, FIG. 14D, and FIG. 14E are sectional viewsillustrating a method of fabricating a light emitting diode according toan exemplary embodiment of the present invention.

FIG. 15A, FIG. 15B, and FIG. 15C are sectional views illustrating amethod of fabricating a light emitting diode according to an exemplaryembodiment of the present invention.

FIG. 16A, FIG. 16B, FIG. 16C, and FIG. 16D are sectional viewsillustrating a method of fabricating a light emitting diode according toan exemplary embodiment of the present invention.

FIG. 17 is a plan view of a convex-concave pattern according to anexemplary embodiment of the present invention.

FIG. 18A, FIG. 18B, FIG. 18C, and FIG. 18D are sectional viewsillustrating a method of fabricating a light emitting diode according toan exemplary embodiment of the present invention.

FIG. 19A, FIG. 19B, FIG. 19C, and FIG. 19D are sectional viewsillustrating a method of fabricating a light emitting diode according toan exemplary embodiment of the present invention.

FIG. 20 and FIG. 21 are cross-sectional SEM images of convex-concavepatterns after growing an epitaxial layer on the convex-concave patternsprepared in Convex-Concave Pattern Preparation Examples 1 and 2.

FIG. 22A, FIG. 22B, and FIG. 22Care SEM images of a substrate having aconvex-concave pattern prepared in Convex-Concave Pattern PreparationExample 3.

FIG. 23 is a graph depicting current output of light emitting diodesprepared in Light Emitting Diode Preparation Examples 2 and 3.

FIG. 24A and FIG. 24B are SEM images of a substrate having aconvex-concave pattern prepared in Convex-Concave Pattern PreparationExample 4.

DETAILED DESCRIPTION OF THE ILLUSTRATED EMBODIMENTS

Exemplary embodiments of the present invention will be described in moredetail with reference to the accompanying drawings. It should beunderstood that the following exemplary embodiments are given by way ofillustration only to provide thorough understanding of the invention tothose skilled in the art. Therefore, the present invention is notlimited to the following exemplary embodiments and may be embodied indifferent ways. Further, like components will be denoted by likereference numerals throughout the specification, and the widths,lengths, and thicknesses of certain elements, layers or features may beexaggerated for clarity.

It will be understood that when an element is referred to as beingplaced “above” or “on” another element, it can be directly placed on theother element, or an intervening layer(s) may also be present. In otherwords, the expressions of spatial orientations are to be construed asindicating relative orientations instead of absolute orientations. Inaddition, it will be understood that, although the terms “first”,“second”, etc. may be used herein to distinguish various elements,components, regions, layers and/or sections from one another, theseelements, components, regions, layers and/or sections should not belimited by these terms. It will be understood that for the purposes ofthis disclosure, “at least one of X, Y, and Z” can be construed as Xonly, Y only, Z only, or any combination of two or more items X, Y, andZ (e.g., XYZ, XYY, YZ, ZZ).

FIG. 1 and FIG. 2 are a schematic plan view and a schematic sectionalview of a light emitting diode according to an exemplary embodiment ofthe present invention, respectively, and FIG. 3 is a schematic view of alight emitting unit 101 shown in FIG. 1.

Referring to FIG. 1, FIG. 2,and FIG. 3, a light emitting diode accordingto an exemplary embodiment of the present invention includes a substrate10, a plurality of light emitting units UD 100, 200 and interconnectionwires 46. The light emitting diode may further include first and secondelectrode pads 300 a, 300 b. Each of the light emitting units 100, 200may include a current spreading conductive layer 44 formed on an upperside thereof, a first electrode 100 a or 200 a and a second electrode100 b or 200 b. Further, the light emitting diode may include apassivation layer 43 and an isolation layer 40.

The substrate 10 may be a sapphire (Al₂O₃), silicon carbide (SiC),gallium nitride (GaN), indium gallium nitride (InGaN), aluminum galliumnitride (AlGaN), aluminum nitride (AlN), gallium oxide (Ga₂O₃), orsilicon substrate. The substrate 10 may be an insulating substrate suchas a sapphire substrate, or a conductive substrate with an insulatinglayer formed thereon.

The substrate 10 generally has a quadrilateral shape, for example, arectangular shape, as shown in the drawings. As referred to herein, theshapes of the substrate 10 and the light emitting units 100, 200, thatis, shapes such as a quadrilateral shape, a parallelogram shape, atriangular shape, and the like, are shapes in plan view. Here, apolygonal shape such as a triangular shape, a quadrilateral shape or aparallelogram shape may include a slightly modified polygonal shape. Forexample, such a polygonal shape may have a rounded angle portion.

As used herein, the term “parallelogram shape” is a quadrilateral shapehaving acute angles and obtuse angles unlike a rectangular shape. Theacute angle portions may be rounded to have a greater curvature than theobtuse angle portions. In addition, as used herein, the “triangularshape” has three acute angles, and acute angle portions of thetriangular shape may also be rounded. The triangular shape with threeacute angles may be an equilateral triangular shape.

Since the light emitting units may have a parallelogram shape or atriangular shape, the light emitting diode may reduce optical lossoccurring at side surfaces of the light emitting units, and optical lossdue to optical interference between the light emitting units or opticalabsorption.

The substrate 10 may include a convex-concave pattern 10 a formed on anupper surface thereof and including concavities 10 ac and convexities 10av, and some of the convex-concave pattern 10 a placed in a partialregion may include fine convexities and concavities P formed on asurface thereof. Particularly, the convex-concave pattern 10 a havingthe fine convexities and concavities P may be formed in a regionexcluding lower regions of the light emitting units UD, for example, inan isolation groove G that isolates the light emitting units UD fromeach other. In addition, as will be described below, the region of theconvex-concave pattern 10 a, in which the fine convexities andconcavities P are formed, may be formed under a mesa-etched region R ofthe light emitting units UD. The fine convexities and concavities P maybe irregularly formed. The fine convexities and concavities P mayalternatively be regularly formed.

The plurality of light emitting units UD may include at least one lightemitting unit 100 having a parallelogram shape having two acute anglesand two obtuse angles, and at least one light emitting unit 200 having atriangular shape. As shown in FIG. 1, the parallelogram-shaped lightemitting units 100 having two acute angles and two obtuse angles may bearranged in two rows such that the first and second rows have the samenumber of light emitting units 100 arranged therein.

When the substrate 10 has a rectangular shape, two sides of each of theparallelogram-shaped light emitting units 100 are parallel to two sidesof the substrate 10, and two other sides thereof are not parallel to anyside of the substrate 10. As shown in FIG. 3, the light emitting unit100 includes first sides 101 (see FIG. 3) facing each other and secondsides 103 (see FIG. 3) facing each other. Here, the light emitting units100 are arranged on the substrate 10 such that the first sides 101 areparallel to edges of the substrate 10 and the second sides 103 are notparallel to any edge of the substrate 10.

As shown in FIG. 3, an obtuse angle defined between the first side 101and the second side 103 may be greater than 90° and equal to or lessthan 135°. As the obtuse angle (θ) approaches 135°, the light emittingdiode has further improved light extraction efficiency. As such, whenthe light emitting unit has a parallelogram shape, optical loss withineach of the light emitting units is reduced, thereby reducing opticalloss by optical interference between the light emitting units andoptical absorption by the light emitting units. Here, an obtuse angle θgreater than 135° may make it difficult to achieve uniform spreading ofelectric current over the region of the light emitting units. In theparallelogram-shaped light emitting units, acute angle portions andobtuse angle portions may be rounded. Particularly, the acute angleportions and the obtuse angle portions may be rounded such that theacute angle portions have a greater curvature (1/radius) than the obtuseangle portions.

Referring again to FIG. 1, the first row of the light emitting units 100and the second row of the light emitting units 100 may be disposed tohave a mirror symmetrical structure relative to a mirror plane passingthrough a dotted line L1 to be perpendicular to the substrate 10. Here,the overall contours of the parallelogram-shaped light emitting unitshave a mirror symmetrical structure and it is not necessary for all ofthe interconnection wires 46 and electrodes 100 a, 100 b to have asymmetry structure. As shown, the first and second rows of lightemitting units 100, 100 are disposed such that sides facing each otherare parallel to each other.

The triangular light emitting unit 200 may be placed over the first rowand the second row. As the light emitting units 100 are arranged in thefirst and second rows, the light emitting units 100 provide a protrudingcontour at one end of each row and a recessed contour at the other endthereof. The triangular light emitting unit 200 is disposed near oneside edge of the substrate 10 to fill the recessed contour.

For example, the triangular light emitting unit 200 may have anisosceles triangular shape that has a long side 201 and two other sides203 having the same length. The triangular light emitting unit 200 maybe disposed such that the long side 201 is parallel to the one side edgeof the substrate 10. One of the sides 203 may be parallel to the secondside 103 of the light emitting units 100 in the first row, and the otherside 203 may be parallel to the second side of the light emitting unit100 in the second row.

As shown in FIG. 1, the plurality of light emitting units may becomposed of six parallelogram-shaped light emitting units 100 and asingle triangular light emitting unit 200. For example, more lightemitting units may be arranged in two rows by increasing the number ofparallelogram-shaped light emitting units 100 disposed in each row. Aplurality of light emitting diodes including seven light emitting unitsas shown in FIG. 1 may be electrically connected to each other, therebyproviding a light emitting module that can be operated by a high voltageAC such as 110V or 220VAC.

As shown in FIG. 2, each of the light emitting units UD may have astack, which includes a first conductivity-type semiconductor layer 23,an active layer 25 and a second conductivity-type semiconductor layer27, and which may further include a buffer layer 21. In addition, ineach of the light emitting units UD, at least one of the firstconductivity-type semiconductor layer 23, the active layer 25, and thesecond conductivity-type semiconductor layer 27 may have a side surfaceinclined at an angle of less than 90° relative to a surface of thesubstrate 10.

The active layer 25 may have a single quantum-well structure or amulti-quantum well structure, and may have a composition determineddepending upon a desired wavelength of light generated therein. Forexample, the active layer 25 may be formed of an AlInGaN-based compoundsemiconductor, for example, InGaN. On the other hand, the first andsecond conductivity-type semiconductor layers 23, 27 may be formed of amaterial having a greater band gap than the active layer 25, and may beformed of an AlInGaN-based compound semiconductor, for example, GaN.

As shown, the second conductivity-type semiconductor layer 27 is formedon a partial region of the first conductivity-type semiconductor layer23, and the active layer 25 is disposed between the secondconductivity-type semiconductor layer 27 and the first conductivity-typesemiconductor layer 23. Further, the second conductivity-typesemiconductor layer 27 may have a current spreading conductive layer,for example, a transparent electrode layer 44, formed on an upper sidethereof. The transparent electrode layer 44 may be formed of indium tinoxide (ITO), Ni/Au, and the like.

The first and second conductivity-type semiconductor layers 23, 27 maybe an n-type semiconductor layer and a p-type semiconductor layer,respectively, or vice versa. The first electrodes 100 a, 200 a (seeFIG. 1) are formed on the first conductivity-type semiconductor layer23, and the second electrodes 100 b, 200 b (see FIG. 1) are formed onthe second conductivity-type semiconductor layer 27. The secondelectrodes 100 b, 200 b may be formed on the transparent electrode layer44. As shown in FIG. 1, the first electrode 100 a and the secondelectrode 100 b are disposed to face each other.

The first electrode 100 a may have a linear shape, and the secondelectrodes 100 b, 200 b may have a curved shape. The second electrode100 b is formed at one end thereof near the obtuse angle portion, and atthe other end thereof near the acute angle portion, wherein the otherend of the second electrode 100 b disposed near the acute angle portionis further distant from the angle portion than the one end disposed nearthe obtuse angle portion. The curved shape of the second electrodes 100b, 200 b can improve current spreading within the light emitting unit,thereby improving luminous efficacy. On the other hand, theinterconnection wire 46 is connected to the second electrode 100 b in astate of being biased towards the obtuse angle portion. Accordingly, theinterconnection wires 46 may have a relatively short length, therebyreducing blockage of light by the interconnection wires 46.

On the other hand, a first electrode pad 300 a and a second electrodepad 300 b are disposed on the substrate 10. The first and secondelectrode pads 300 a, 300 b may be arranged in the two rows. Inaddition, as shown in FIG. 1, the first and second electrode pads 300 a,300 b are formed near the other side edge of the substrate 10 oppositethe one side edge of the substrate 10 at which the triangular lightemitting units 100 are formed.

The first and second electrode pads 300 a, 300 b may be formed on thesubstrate 10, the first conductivity-type semiconductor layer 23, thesecond conductivity-type semiconductor layer 27 or the transparentelectrode layer 44 to be separated from light emitting units 300, 400.Alternatively, the first and second electrode pads 300 a, 300 b may bedisposed on the light emitting units 100 or 200. In the presentexemplary embodiment, the first and second electrode pads 300 a, 300 bare separated from the light emitting units 100, 200, whereby lightemitted from the light emitting units can be prevented from beingblocked by the first and second electrode pads, thereby improving lightextraction efficiency.

The first and second electrode pads 300 a, 300 b are pads for supplyingelectric power from an external power source, and may be bonded to, forexample, bonding wires. The light emitting diode is driven by powerapplied to the first and second electrode pads 300 a, 300 b.

The interconnection wires 46 electrically connect adjacent lightemitting units 100, 200 to each other. The interconnection wires 46 mayconnect the adjacent light emitting units 100, 200 to each other inseries. That is, the interconnection wires 46 connect the firstelectrode 100 a of one light emitting unit to the second electrode 100 bof another light emitting unit adjacent thereto. The interconnectionwires 46 and the electrodes 100 a, 100 b, 200 a, 200 b may be formed ofthe same materials by the same process. The passivation layer 43 coversthe transparent electrode layer 44 while partially exposing thetransparent electrode layer 44 therethrough. In addition, thepassivation layer 43 may cover a side surface of the light emittingunits UD exposed to the mesa-etched region R. The isolation layer 40 maycover an upper surface of the substrate 10 and the side surfaces of thelight emitting units UD exposed in the isolation groove G. The isolationlayer 40 prevents the second conductivity-type semiconductor layer 27and the first conductivity-type semiconductor layer 23 from suffering ashort circuit by the interconnection wires 46. The passivation layer 43and the isolation layer 40 may be formed of the same materials by thesame process.

As shown in FIG. 2, a protrusion of a semiconductor stack may beinterposed between the mesa-etched region R and the isolation groove G.Alternatively, the mesa-etched region R and the isolation groove G maybe formed directly adjacent each other without the protrusion of thesemiconductor stack. Thus, the lengths of the interconnection wires 46can be decreased, thereby reducing optical absorption by theinterconnection wires 46.

FIG. 4 and FIG. 5 are a schematic plan view and a sectional view of alight emitting diode according to an exemplary embodiment of the presentinvention.

Referring to FIG. 4 and FIG. 5, the light emitting diode according tothe present exemplary embodiment includes a substrate 10, a plurality oflight emitting units (UD) 100, 200, and interconnection wires 46 as inthe light emitting diode described with reference to FIG. 1, FIG. 2, andFIG. 3. In the present exemplary embodiment, however, the light emittingunits 100 are triangular light emitting units that have three acuteangles, and the light emitting units 200 are triangular or pentagonallight emitting units having obtuse angles.

In addition, as described with reference to FIG. 1, FIG. 2, and FIG. 3,the light emitting diode may include first and second electrode pads 300a, 300 b, and each of the light emitting units 100, 200 may have acurrent spreading conductive layer 44 placed thereon. In addition, eachof the light emitting units 100 may have a first electrode 100 a and asecond electrode 100 b, and each of the light emitting units 200 mayhave a first electrode 200 a and a second electrode 200 b. Further, thelight emitting diode may include a passivation layer 43 and an isolationlayer 40.

The material and shape of the substrate 10, and the convex-concavepattern 10 a formed on the upper side of the substrate are similar tothose of the exemplary embodiment described above with reference to FIG.1, FIG. 2, and FIG. 3.

The plurality of light emitting units UD include triangular lightemitting units 100 having three acute angles, and may also includetriangular or pentagonal light emitting units 200 having obtuse angles.

When the substrate 10 has a rectangular shape, two sides of each of thetriangular light emitting units 100 are parallel to two sides of thesubstrate 10, and two other sides thereof are not parallel to any sideof the substrate 10. The light emitting units 100 may have a regulartriangular shape. At least six light emitting units 100 may be radiallyarranged about one point. The one point may be placed near a centralportion, or may be a center C of the substrate, which may be marked orunmarked. Although only six light emitting units 100 are illustrated asbeing radially arranged in FIG. 4, this arrangement may be furtherprovided by increasing the number of light emitting units 100.

By the triangular light emitting units 100 having acute angles, thelight emitting diode has improved light extraction efficiency throughthe acute angle portions. In addition, at least six light emitting units100 are radially arranged and the acute angle portions are rounded,whereby optical loss can be reduced near the center C of the substrateat which the at least six light emitting units are gathered, therebyimproving light extraction efficiency.

As shown in FIG. 4, the light emitting units 100 may be arranged at bothsides of a straight line L1 passing through the center (C) and may bearranged in a mirror symmetrical structure relative to a vertical planepassing through the center (C).

The light emitting units 100 arranged at both sides of the straight lineL1 are connected to each other by the interconnection wires 46 to formtwo serial arrays. These serial arrays may be arranged in a mirrorsymmetrical structure, whereby not only the light emitting units 100 butalso the interconnection wires 46 and the electrodes 100 a, 100 b areall arranged in a mirror symmetry structure.

The triangular or pentagonal light emitting units 200 may be disposednear opposite side edges of the substrate 10. With the symmetryarrangement of the light emitting units 100, concave contours may beformed near the opposite side edges of the substrate 10 by the lightemitting units 100. The triangular or pentagonal light emitting unit 200may be disposed near each side edge of the substrate 10 such that theconcave contour can be filled therewith.

The first electrode pad 300 a is formed on the light emitting unit 200at one side edge of the substrate, and the second electrode pad 300 b isplaced on the light emitting unit 200 at the other side edge thereof.The serial array of the light emitting units 100, 200 are connected inparallel to each other between the first electrode pad 300 a and thesecond electrode pad 300 b. Since the serial arrays are connected inparallel to each other, the light emitting diode allows uniform currentspreading, thereby improving current injection efficiency between thelight emitting units 100, 200.

As shown in FIG. 4, the light emitting units 200 are disposed atopposite ends of each of the serial arrays, such that the triangularlight emitting units 100 having acute angles are placed therebetween. Inthe present exemplary embodiment, five light emitting units 100 and twolight emitting units 200 are connected to each other to constitute aserial array. Alternatively, more light emitting units may be connectedto each other in series by increasing the number of light emitting units100 disposed in each of the arrays. For example, as shown in FIG. 4, aplurality of light emitting diodes each including seven light emittingunits may be electrically connected to each other, thereby providing alight emitting module that can be operated by a high voltage AC, such as110V or 220VAC.

As shown in FIG. 5, each of the light emitting units UD may have astack, which includes a first conductivity-type semiconductor layer 23,an active layer 25, and a second conductivity-type semiconductor layer27, and which may further include a buffer layer 21. In addition, ineach of the light emitting units UD, at least one of the firstconductivity-type semiconductor layer 23, the active layer 25, and thesecond conductivity-type semiconductor layer 27 may have a side surfaceinclined at an angle of less than 90° relative to a surface of thesubstrate 10. The active layer 25, first conductivity-type semiconductorlayer 23, and second conductivity-type semiconductor layer 27 are thesame as those described with reference to FIG. 2, and thus, a repeateddescription thereof will be omitted.

In the present exemplary embodiment, the first electrodes 100 a, 200 a(see FIG. 4) are formed on the first conductivity-type semiconductorlayer 23, and the second electrodes 100 b, 200 b (see FIG. 4) are placedon the second conductivity-type semiconductor layer 27. The firstelectrode 100 a or 200 a may be electrically connected to the firstconductivity-type semiconductor layer 23 through a groove, which isformed through the second conductivity-type semiconductor layer 27 andthe active layer 25. The second electrodes 100 b, 200 b may be formed onthe transparent electrode layer 44. As shown in FIG. 4, the firstelectrode 100 a and the second electrode 100 b are disposed to face eachother.

The first electrodes 100 a may have a dot shape and the secondelectrodes 100 b may have a curved shape. The second electrodes 100 bare disposed along one side of a triangular shape. The curved shape ofthe second electrodes 100 b can improve current spreading within thelight emitting unit, thereby improving luminous efficacy. On the otherhand, the interconnection wire 46 is connected to the second electrode100 b in a state of being biased towards the acute angle portion.Accordingly, the interconnection wires 46 may have a relatively shortlength, thereby reducing blockage of light by the interconnection wires46.

The first and second electrode pads 300 a, 300 b are pads for supplyingelectric power from an external power source, and may be bonded to, forexample, bonding wires. The light emitting diode is driven by powerapplied to the first and second electrode pads 300 a, 300 b.

The interconnection wires 46, the passivation layer 43 and the isolationlayer 40 are similar to those of the light emitting diode described withreference to FIG. 1, FIG. 2, and FIG. 3, and thus, repeated descriptionsthereof will be omitted.

As shown in FIG. 5, a protrusion of a semiconductor stack may beinterposed between the mesa-etched region R and the isolation groove G.Alternatively, the mesa-etched region R and the isolation groove G maybe formed directly adjacent each other without the protrusion of thesemiconductor stack. Thus, the lengths of the interconnection wires 46can be decreased, thereby reducing optical absorption by theinterconnection wires 46.

FIG. 6A and FIG. 6B are schematic plan views of light emitting diodesaccording to exemplary embodiments of the invention. In these exemplaryembodiments, the mesa-etched region R is formed directly adjacent theisolation groove G.

Referring to FIG. 6A, the light emitting diode according to thisexemplary embodiment is generally similar to the light emitting diodeshown in FIG. 4 and FIG. 5 except that first electrodes 100 a, 200 a areformed in the mesa-etched region R near the isolation groove G.

Referring to FIG. 6B, the light emitting diode according to thisexemplary embodiment is generally similar to the light emitting diode ofFIG. 6A except that the light emitting units 200 of FIG. 6A are dividedinto two light emitting units 400 relative to the line L1. Here, each ofthe first electrode pad 300 a and the second electrode pad 300 b may beformed over two light emitting units 400 between these light emittingunits 400.

Next, a method of fabricating a light emitting diode according to anexemplary embodiment of the present invention will be described. Thefollowing method may be applied not only to the light emitting diodedescribed with reference to FIG. 1, FIG. 2, and FIG. 3, but also to thelight emitting diode described with reference to FIG. 4 or FIG. 6.

FIG. 7A, FIG. 7B, FIG. 7C, FIG. 7D, FIG. 7E, FIG. 7F, FIG. 7G, FIG. 7H,FIG. 7I, and FIG. 7J are sectional views illustrating a method offabricating a light emitting diode according to an exemplary embodimentof the present invention. Specifically, FIG. 7A to FIG. 7E are sectionalviews illustrating a method of forming a convex-concave pattern within asubstrate, and FIG. 7F to FIG. 7J are sectional view illustrating amethod of fabricating a light emitting diode using the substrate havingthe convex-concave pattern.

Referring to FIG. 7A, a substrate 10 is prepared. The substrate 10 maybe may be a sapphire (Al₂O₃), silicon carbide (SiC), gallium nitride(GaN), indium gallium nitride (InGaN), aluminum gallium nitride (AlGaN),aluminum nitride (AlN), gallium oxide (Ga₂O₃), or silicon substrate. Thesubstrate 10 may be a sapphire substrate.

An etching mask layer 13 is formed on an upper surface of the substrate10. The etching mask layer 13 may be a silicon oxide layer, a siliconnitride layer or a silicon nitride oxide layer. However, the etchingmask layer 13 may be formed of any material having etching selectivitywith respect to the substrate 10. A photoresist pattern 17 may be formedon the etching mask layer 13.

Referring to FIG. 7B, the etching mask layer 13 may be subjected to wetetching or dry etching using the photoresist pattern 17 as a mask. As aresult, an etching mask pattern 13 a may be formed. When the etchingmask layer 13 is a silicon oxide layer, the etching mask layer 13 may beetched using a HF or BOE (buffered oxide etchant) solution.

The etching mask pattern 13 a may be formed in various shapes. Forexample, the etching mask pattern 13 a may have a stripe shape (FIG. 8),a circular island shape (FIG. 9), or a polygonal island shape (FIG. 10),as shown in FIG. 8, FIG. 9, and FIG. 10. When unit patterns of theetching mask pattern 13 a have an island shape, the unit patterns of theetching mask pattern 13 a may be disposed such that six unit patternssurround a single unit pattern in a hexagonal arrangement.

Referring to FIG. 7C, the etching mask pattern 13 a may be exposed byremoving the photoresist pattern 17. With the etching mask pattern 13 aas a mask, the substrate 10 may be subjected to primary etching to forma convex-concave pattern 10 a including concavities 10 ac andconvexities 10 av on the upper surface of the substrate 10. Thesubstrate 10 may be etched by wet etching.

An etching solution used for wet etching may exhibit significantlydifferent etching rates dependent upon a crystal direction of thesubstrate 10. In other words, the etching solution may preferentiallyetch the substrate 10 in a specific crystal direction. By way ofexample, when the substrate 10 is a sapphire substrate or a GaNsubstrate, the etching solution may be a mixture of sulfuric acid andphosphoric acid, a mixture of nitric acid and phosphoric acid, or a KOHsolution. When the substrate 10 is a SiC substrate, the etching solutionmay be a BOE (buffered oxide etchant) or HF solution, and when thesubstrate 10 is a Si substrate, the etching solution may be a KOHsolution. When the substrate 10 is a c-plane sapphire substrate and theetching solution is a mixture of sulfuric acid and phosphoric acid in avolume ratio of 3:1, the c-plane may be etched in the course of wetetching. In this case, bottom surfaces of the concavities 10 ac andupper surfaces of the convexities 10 av may be c-planes.

Referring to FIG. 7D, the upper surfaces of the convexities 10 av areexposed by removing the etching mask pattern 13A. The upper surfaces ofthe convexities 10 av may be planar surfaces, and facets thereof mayhave a first inclined angle θ1 relative to the surface of the substrate.Such facets may be first crystal planes. In addition, the angles of thefacets of the convexities 10 av inclined relative to the surface of thesubstrate, that is, sloped angles of the facets of the convexities 10av, may be identical or may be different dependent upon the facetsthereof. Further, bottom surfaces of the concavities 10 ac placedbetween the convexities 10 av may be coplanar with the surface of thesubstrate.

Referring to FIG. 7E, the substrate 10 having the convex-concave pattern10 a may be subjected to secondary etching. As a result, the convexities10 av may be changed to have lower facets LF, which are first crystalplanes, and upper facets UF, which are second crystal planes differentthan the first crystal plane, in which the second crystal planes meet toform an upper vertex V.

Secondary etching may also be wet etching. An etching solution used insecondary etching may be the same or different from the etching solutionused in primary etching. When the etching solution used in secondaryetching is different from the etching solution used in primary etching,a crystal plane different from the crystal plane of the substratepreferentially etched in primary etching may be preferentially etched.On the other hand, when the etching solution used in secondary etchingis the same as the etching solution used in primary etching, the bottomsurfaces of the concavities 10 ac are continuously etched, whereby thefirst crystal planes of the convexities 10 av are extended towards thesubstrate 10, thereby forming the lower facets LF.

On the other hand, in upper regions of the convexities 10 av, the firstcrystal planes formed in the course of primary etching are alsogradually etched, whereby other crystal planes, that is, the secondcrystal planes, can be exposed, thereby forming the upper facets UF.Such secondary etching may be performed until all of the upper surfacesof the convexities 10 av are etched and the upper vertex V formed wherethe second crystal planes meet can be formed (see dotted line F of FIG.7D).

Referring to FIG. 11 and FIG. 12, the convex-concave pattern will bedescribed in more detail. FIG. 7E is a cross-sectional view taken alongline I-I′ of FIG. 11. In addition, FIG. 12 is a perspective view of oneconvexity.

Referring to FIG. 7E, FIG. 8 and FIG. 12, the convex-concave pattern 10a includes a plurality of convexities 10 av and a plurality ofconcavities 10 ac defined by the convexities 10 av. The concavities 10ac placed between convexities 10 av may have bottom surfaces that are ssubstantially parallel to the surface of the substrate. The convexities10 av may include a plurality of facets UF, LF, which are crystalplanes, and one upper vertex V formed where some of the facets UF, LFmeet. Specifically, the facets UF and LF may include lower facets LFwhich are first crystal planes, and upper facets UF which are secondcrystal planes. Here, the upper vertex V may be formed where the upperfacets UF meeting. An inclined angle θ2 of the upper facets UF relativeto the surface of the substrate may be smaller than an inclined angle θ1of the lower facets LF relative to the surface of the substrate.

The convexities may have a stripe shape or an island shape correspondingto the shape of the etching mask pattern 13 a described with referenceto FIG. 8, FIG. 9, and FIG. 10. When the etching mask pattern 13 a has acircular or polygonal island shape, particularly, a circular islandshape, the bottom surfaces defined by the lower facets LF of theconvexities 10 av may have a quasi-triangular shape, each line of whichis a curved line bulging outwards, as shown in FIG. 11 and FIG. 12. Inaddition, the upper facets UF of the convexities 10 av may have asubstantially hexagonal shape in top view.

Referring to FIG. 7F, a buffer layer 21 may be formed on the substratehaving the convex-concave pattern 10 a formed thereon. When thesubstrate 10 has a different lattice parameter than the firstconductivity-type semiconductor layer described below, the buffer layer21 relieves lattice mismatch therebetween, and may be an undoped GaNlayer.

Here, an uppermost end of each of the convexities 10 av is a sharpvertex V, and each of the facets UF and LF thereof may have apredetermined inclined angle relative to the surface of the substrate,whereby the buffer layers 21 can be preferentially grown in a verticaldirection on the bottom surfaces of the concavities 10 ac, which areparallel to the surface of the substrate. Then, the buffer layers 21preferentially grown on the bottom surfaces of adjacent concavities 10ac meet each other beyond the convexities 10 av via lateral growth.Accordingly, threading dislocation density is reduced in a region abovethe convexities 10 av, thereby improving crystal quality. In addition,the method according to the present exemplary embodiment has a reducednumber of processes, as compared with typical epitaxial lateralovergrowth (ELO) using an epitaxial mask pattern.

In addition, since all of the plural facets UF, LF of the convexities 10av are the crystal planes formed by wet etching, these facets have acrystallographically stable surface state, generation of crystal defectsin the buffer layer 21, which are formed on these facets, can besuppressed.

The first conductivity-type semiconductor layer 23 may be formed on thebuffer layer 21. The first conductivity-type semiconductor layer 23 is anitride-based semiconductor layer and may be an n-type impurity dopedlayer. By way of example, the first conductivity-type semiconductorlayer 23 may include a plurality of In_(x)Al_(y)Ga_(1-x-y)N (0≦x≦1,0≦y≦1, x+y≦1) layers having different compositions. Then, the activelayer 25 is formed on the first conductivity-type semiconductor layer23. The active layer 25 may be an In_(x)Al_(y)Ga_(1-x-y)N (0≦x≦1, 0≦y≦1,0≦x+y≦1) layer, and may have a single quantum well structure or amulti-quantum well (MQW) structure. By way of example, the active layer25 may have a single quantum well structure of an InGaN or AlGaN layer,or a multi-quantum well structure, which is a multilayer structure ofInGaN/GaN, AlGaN/(In)GaN, or InAlGaN/(In)GaN. The secondconductivity-type semiconductor layer 27 may be formed on the activelayer 25. The second conductivity-type semiconductor layer 27 may alsobe a nitride-based semiconductor layer, and may be a p-type impuritydoped layer. By way of example, the second conductivity-typesemiconductor layer 27 may be formed by doping anIn_(x)Al_(y)Ga_(1-x-y)N (0≦x≦1, 0≦y≦1, 0≦x+y≦1) layer with a p-typedopant such as Mg or Zn elements. Alternatively, the secondconductivity-type semiconductor layer 27 may include a plurality ofIn_(x)Al_(y)Ga_(1-x-y)N (0≦x≦1, 0≦y≦1, 0≦x+y≦1) layers having differentcompositions.

The buffer layer 21, the first conductivity-type semiconductor layer 23,the active layer 25, and the second conductivity-type semiconductorlayer 27 may form a stack, and may be formed by various deposition orgrowth processes including metal organic chemical vapor deposition(MOCVD), chemical vapor deposition (CVD), plasma-enhanced chemical vapordeposition (PECVD), molecular beam epitaxy (MBE), hydride vapor phaseepitaxy (HYPE), and the like.

Referring to FIG. 7G, an isolation groove G is formed to isolate theplurality of light emitting units UD from each other by etching someregion of the stack until the substrate 10 is exposed therethrough.Formation of the isolation groove G may be achieved by dry etching, forexample, plasma etching. When an etching gas used in dry etching hasgood etching selectivity, the convex-concave pattern 10 a exposed in theisolation groove G may remain instead of being etched. By the isolationgroove G, the semiconductor stack is divided into regions for theparallelogram-shaped light emitting units 100 and a region for thetriangular light emitting unit 200, as described with reference to FIG.1 to FIG. 3, or into regions for the triangular light emitting units 100having three acute angles and regions for the light emitting units 200as described with reference to FIG. 4 and FIG. 5.

Referring to FIG. 7H, a metal layer (not shown) is stacked on theconvex-concave pattern 10 a and the side and upper surfaces of the lightemitting units UD exposed in the isolation groove G, and the substratehaving the metal layer stacked thereon is then subjected to heattreatment to form metal clusters 34. The metal layer may have athickness of several nanometers to dozens of nanometers, for example, athickness from about 3 nm to about 20 nm, specifically a thickness ofabout 10 nm. Further, the metal layer and the metal clusters are formedof Ni, Al, or Pt. Before the metal layer is formed, a protective layer(not shown) may be optionally formed on the side and upper surfaces ofthe light emitting units UD. The protective layer may be a silicon oxidelayer or a silicon nitride layer and prevents the metal layer or themetal clusters from reacting with the side or upper surfaces of thelight emitting units UD.

A photoresist pattern 37 may be formed on the metal clusters 34 to coverthe side and upper surfaces of the light emitting units UD. The surfacesof the convex-concave patterns 10 a within the isolation groove G may beetched using the photoresist pattern 37 and the metal clusters 34 as amask. As a result, fine convexities and concavities P (see FIG. 7I) maybe formed on the surfaces of the convex-concave patterns 10 a within theisolation groove G, specifically, on the surfaces of the convexities 10av and the concavities 10 ac. Etching of the surfaces of theconvex-concave patterns 10 a within the isolation groove G may becarried out by plasma etching. Here, the photoresist pattern 37 canprevent damage to the light emitting units UD by plasma.

Referring to FIG. 7I, the photoresist pattern 37 and the metal clusters34 may be removed. As a result, the convex-concave patterns 10 a havingthe fine convexities and concavities P on the surfaces thereof withinthe isolation groove G may be exposed.

Referring to FIG. 7J, a mesa-etched region R may be formed on the uppersurface of each of the light emitting units UD to expose the firstconductivity-type semiconductor layer 23 therethrough by etching thesecond conductivity-type semiconductor layer 27 and the active layer 25.On a side surface of the mesa-etched region R, the secondconductivity-type semiconductor layer 27 and the active layer 25 of eachof the light emitting units UD may be exposed. The mesa-etched region Rmay have a width that gradually decreases as the mesa-etched regionapproaches the substrate 10.

As shown in FIG. 7J, the mesa-etched region R may be separated apredetermined distance from the isolation groove G. That is, themesa-etched region R may be formed in a groove shape penetrating throughthe second conductivity-type semiconductor layer 27 and the active layer25. Alternatively, the mesa-etched region R may be formed directlyadjacent to the isolation groove G.

A current spreading conductive layer, for example, a transparentelectrode layer 44, may be formed on the second conductivity-typesemiconductor layer 27 of each of the light emitting units UD. Thecurrent spreading conductive layer 44 may be a light transmittingconductive layer. For example, the current spreading conductive layer 44may be formed of indium tin oxide (ITO), Ni/Au, or Cu/Au.

Then, after an insulating layer is formed on the overall surface of thesubstrate, the insulating layer is subjected to patterning to form anisolation layer 40, which covers the convex-concave patterns 10 a andthe side surfaces of the light emitting units UD exposed in theisolation groove G, and the passivation layer 43 disposed on the currentspreading conductive layer 44. The isolation layer 40 may extend to onesidewall within the mesa-etched region R adjacent the isolation grooveG. The passivation layer 43 may extend to the other sidewall within themesa-etched region R and may expose a portion of the current spreadingconductive layer 44 therethrough. The isolation layer 40 and thepassivation layer 43 may be formed of a polyimide layer, a silicon oxidelayer, or a silicon nitride layer.

Interconnection wires 46 may be formed on the isolation layer 40 toelectrically connect a pair of light emitting units UD adjacent theisolation layer 40. The interconnection wire 46 may be electricallyconnected to the second conductivity-type semiconductor layer 27(orcurrent spreading layer 44) of one side of the pair of light emittingunits UD, that is, a first light emitting unit, and to the firstconductivity-type semiconductor layer 23 of the other side of the pairof light emitting units UD, that is, a second light emitting unit. Inthis case, the light emitting units UD may be connected to each other inseries by the interconnection wires 46, thereby allowing high operatingvoltage. Particularly, first electrodes 100 a, 200 a (see FIG. 1) andsecond electrodes 100 b, 200 b are formed on the light emitting units UDand connected to each other by the interconnection wires 46. The firstand second electrodes and the interconnection wires may be formed of thesame material by the same process. In addition, a first electrode pad300 a (see FIG. 1 and FIG. 4) and a second electrode pad 300 b (see FIG.1 and FIG. 4) may also be formed together with the interconnection wires46.

The isolation layer 40 may be placed between the interconnection wire 46and the second conductivity-type semiconductor layer 27 of the secondlight emitting unit. The mesa-etched region R may have a width thatgradually decreases as the mesa-etched region approaches the substrate,thereby preventing disconnection of the interconnection wire 46.

FIG. 13A and FIG. 13B are diagrams illustrating reflection of lightemitted from an active layer in various directions by a convex-concavepattern formed at a lower portion of a light emitting diode and aconvex-concave pattern within an isolation region.

Referring to FIG. 13A, in operation of the light emitting diodedescribed with reference to FIG. 7J, light travelling from the activelayer 25 (see FIG. 7J) towards the substrate 10 (see FIG. 7J) under theactive layer will meet the convexities 10 av. Here, since each of theconvexities 10 av has a sharp vertex V and the facets UF, LF havinginclined angles relative to the surface of the substrate, the lightemitted from the active layer 25 (see FIG. 7J) can be reflected invarious directions. As a result, the light emitting diode may haveimproved light extraction efficiency.

Referring to FIG. 13B, light traveling from the active layer 25 (seeFIG. 7J) towards the substrate within the isolation groove G will meetthe convexities 10 av and the concavities 10 ac therebetween. Here, asdescribed with reference to FIG. 13A, the light can be reflected invarious directions by the shapes of the convexities 10 av, that is, thefacets UF, LF having the inclined angles and the sharp vertices. Inaddition, the light can undergo diffuse reflection not only by thesurfaces of the convexities 10 av but also by the fine convexities andconcavities P formed on the surfaces of the concavities 10 ac. As aresult, the light emitting diode may have further improved lightextraction efficiency. In addition, some of the light entering thesubstrate 10 can be easily extracted through the convex-concave pattern10 a having the fine convexities and concavities P.

FIG. 14A, FIG. 14B, FIG. 14C, FIG. 14D, and FIG. 14E are sectional viewsillustrating a method of fabricating a light emitting diode according toan exemplary embodiment of the present invention. The method offabricating a light emitting diode according to the present exemplaryembodiment is similar to the fabrication method described with referenceto FIG. 7A to FIG. 7J except for the following features.

Referring to FIG. 14A, convex-concave patterns 10 a are formed on anupper surface of a substrate 10. The convex-concave patterns 10 a may beformed by the same method as in FIG. 7A to FIG. 7E.

After a metal layer (not shown) is stacked on the convex-concavepatterns 10 a, the substrate having the metal layer stacked thereon issubjected to heat treatment to form metal clusters 34. A photoresistpattern 37 is formed on the metal clusters 34. The photoresist pattern37 exposes some regions, specifically, a first area A1 and a second areaA2. The first area A1 may correspond to an isolation groove describedbelow, and the second area A2 may correspond to the mesa-etched region.Alternatively, the photoresist pattern 37 may expose only the first areaA1 corresponding to the isolation groove described below.

Then, the surfaces of the convex-concave patterns 10 a in the first areaA1 and the second area A1 are etched using the photoresist pattern 37and the metal clusters 34 as a mask. As a result, fine convexities andconcavities P (see FIG. 14B) are formed on the surfaces of theconvex-concave patterns 10 a in the first area A1 and the second areaA2, specifically, on the surfaces of the convexities 10 av and theconcavities 10 ac.

Referring to FIG. 14B, the photoresist pattern 37 and the metal clusters34 are removed. As a result, the convex-concave patterns 10 a having thefine convexities and concavities P within the first area A1 and thesecond area A2 are exposed.

Referring to FIG. 14C, a buffer layer 21 is formed on the substrate, onwhich the convex-concave patterns 10 a having the fine convexities andconcavities P on the surfaces thereof are formed. As a result, asdescribed with reference to FIG. 7F, in a region excluding the firstarea A1 and the second area A2, threading dislocation density may bereduced due to the shapes of the convex-concave patterns 10 a andcrystallographically stable face, thereby improving crystal quality. Inthe first area A1 and the second area A2, threading dislocation may begenerated due to the fine convexities and concavities P formed on thesurfaces of the convex-concave patterns 10 a.

Then, a first conductivity-type semiconductor layer 23, an active layer25, and a second conductivity-type semiconductor layer 27 are formed onthe buffer layer 21 to form a semiconductor stack.

Referring to FIG. 14D, an isolation groove G is formed to isolate thelight emitting units UD from each other by etching a region on the firstarea A1 of the stack until the substrate 10 is exposed. Theconvex-concave patterns 10 a having the surface fine convexities andconcavities exposed to the isolation groove G is exposed. In addition,by the isolation groove G, the semiconductor stack is divided intoregions for the parallelogram-shaped light emitting units 100 and aregion for the triangular light emitting unit 200, as described withreference to FIG. 1 to FIG. 3, or into regions for the triangular lightemitting units 100 having three acute angles and a region for thetriangular and pentagonal light emitting units 200 as described withreference to FIG. 4 and FIG. 5.

Referring to FIG. 14E, a mesa-etched region R may be formed on an uppersurface of each of the light emitting units UD to expose the firstconductivity-type semiconductor layer 13 therethrough by etching thesecond conductivity-type semiconductor layer 27 and the active layer 25.The mesa-etched region R corresponds to the second area A2. Themesa-etched region R may be separated a predetermined distance from theisolation groove G. Alternatively, the mesa-etched region R may beplaced adjacent the isolation groove G. Then, as described withreference to FIG. 7J, a current spreading conductive layer 44, anisolation layer 40, a passivation layer 43, and an interconnection wire46 are formed. The interconnection wire 46 is formed together with thefirst electrodes 100 a, 200 b, the second electrodes 100 b, 200 b andelectrode pads 300 a, 300 b.

In operation of such a light emitting diode, light travelling from theactive layer 25 towards the substrate 10 under the active layer willmeet the convexities 10 av. Here, since each of the convexities 10 avhas a sharp vertex V and the facets UF, LF having inclined anglesrelative to the surface of the substrate, the light emitted from theactive layer 25 can be reflected in various directions. As a result, thelight emitting diode may have improved light extraction efficiency. Inaddition, light traveling from the active layer 25 towards the substratewithin the isolation groove G will meet the convexities 10 av and theconcavities 10 ac therebetween. Here, as described above, not only canthe light be reflected in various directions by the shapes of theconvexities 10 av, but also can undergo diffuse reflection by thesurfaces of the convexities 10 av and the fine convexities andconcavities P formed on the surfaces of the concavities 10 ac. As aresult, the light emitting diode may have further improved lightextraction efficiency by the fine convexities and concavities P.

On the other hand, threading dislocations, which are generated in thefirst area A1 due to the surface fine convexities and concavities P ofthe convex-concave pattern 10 a when forming the stack, can becompletely removed in the course of forming the isolation groove G. Inaddition, when forming the stack, threading dislocations can begenerated in the second area A2 due to the surface fine convexities andconcavities P of the convex-concave pattern 10 a and propagate into theactive layer 25 within this area. However, since the active layer 25within this area is removed in formation of the mesa-etched region R,deterioration in crystal quality of the active layer 25 due to suchthreading dislocations will not occur. Thus, the fine convexities andconcavities P formed on the surfaces of the convex-concave patterns 10 amay improve light extraction efficiency without significantlydeteriorating epitaxial quality in a final device.

FIG. 15A, FIG. 15B, and FIG. 15C are sectional views illustrating amethod of fabricating a light emitting diode according to an exemplaryembodiment of the present invention. The method of fabricating a lightemitting diode according to the present exemplary embodiment may besimilar to the fabrication method described with reference to FIG. 7A toFIG. 7J except for the following features.

Referring to FIG. 15A, a substrate 10 is prepared. An etching mask layer13 is formed on an upper surface of the substrate 10. A photoresistpattern 18 is formed on the etching mask layer 13.

Referring to FIG. 15B, the etching mask layer 13 may be subjected to wetor dry etching using the photoresist pattern 18 as a mask. As a result,an etching mask pattern 13 a is formed. The etching mask pattern 13 amay be formed to a width ranging from 0.2 μm to 1 μm. To this end, thewidth of the photoresist pattern 18 may be adjusted. The etching maskpattern 13 a may have various shapes. For example, the etching maskpattern 13 a may have a stripe shape (FIG. 8), a circular island shape(FIG. 9), or a polygonal island shape (FIG. 10), as shown in FIG. 8 toFIG. 10.

Referring to FIG. 15C, the etching mask pattern 13 a may be exposed byremoving the photoresist pattern 18. With the etching mask pattern 13 aas a mask, the substrate 10 may be subjected to etching to form aconvex-concave pattern 10 a including concavities 10 ac and convexities10 av on the upper surface of the substrate 10. The substrate 10 may beetched by wet etching.

The convexities 10 av may have lower facets LF, which are first crystalplanes, and upper facets UF, which are second crystal planes differentthan the first crystal plane, in which the second crystal planes meet toform an upper vertex V. In addition, the bottom surfaces of theconcavities 10 ac placed between the convexities 10 av may besubstantially parallel to the surface of the substrate.

Etching may be wet etching. An etching solution used in the etchingprocess may exhibit a significantly different etching rate dependentupon a crystal direction of the substrate 10. In other words, theetching solution may preferentially etch the substrate 10 in a specificcrystal direction. By way of example, when the substrate 10 is asapphire substrate or a GaN substrate, the etching solution may be amixture of sulfuric acid and phosphoric acid, a mixture of nitric acidand phosphoric acid, or a KOH solution. When the substrate 10 is a SiCsubstrate, the etching solution may be a BOE (buffered oxide etchant) orHF solution, and when the substrate 10 is a Si substrate, the etchingsolution may be a KOH solution. By way of example, when the substrate 10is a c-plane sapphire substrate and the etching solution is a mixturesolution of sulfuric acid and phosphoric acid in a volume ratio of 3:1,the c-plane may be preferentially etched in the course of wet etching.

During such a wet etching process, the substrate 10 exposed through theetching mask patterns 13 a is etched such that the first crystal planes(dotted line F) inclined at a first angle (θ1) relative to the surfaceof the substrate may be exposed. Then, the substrate 10 is furtheretched such that the first crystal planes extend in a lower direction ofthe substrate 10 to form the lower facets LF of the convexities 10 av.On the other hand, the first crystal planes (dotted line F) formed in aninitial stage of etching and placed near the surface of the substrate 10are also gradually etched to expose other crystal planes, that is,second crystal planes inclined at a first angle θ2 relative to thesurface of the substrate, which can constitute upper facets UF. Thesecond crystal planes meet to form an upper vertex V.

In this way, the etching mask pattern 13 a is formed to have a smallwidth, for example, a width of 0.2 μm to 1 μm, whereby the etchingsolution can sufficiently infiltrate a lower portion of the etching maskpattern 13 a, with the etching mask pattern 13 a remaining, therebyforming the upper facets UF and the upper vertex V.

Next, the process is performed in the manner as described with referenceto FIG. 7F and FIG. 7J, thereby preparing a light emitting diode asshown in FIG. 7J.

FIG. 16A, FIG. 16B, FIG. 16C, and FIG. 16D are sectional viewsillustrating a method of fabricating a light emitting diode according toan exemplary embodiment of the present invention. The method offabricating a light emitting diode according to the present exemplaryembodiment may be similar to the fabrication method described withreference to FIG. 7A to FIG. 7J except for the following features.

Referring to FIG. 16A, an etching mask pattern 13 a is formed on asubstrate 10. The etching mask pattern 13 a may be formed by a processsimilar to the process described with reference to FIG. 7A and FIG. 7B.The etching mask pattern 13 a may be formed using a silicon oxide layer,a silicon nitride layer, or a silicon nitride oxide layer. However, theetching mask layer 13 may be formed of any material having etchingselectivity with respect to the substrate 10. The etching mask pattern13 a may be formed in various shapes. For example, the etching maskpattern 13 a may have a stripe shape (FIG. 8), a circular island shape(FIG. 9), or a polygonal island shape (FIG. 10), as shown in FIG. 8 toFIG. 10. When unit patterns of the etching mask pattern 13 a have anisland shape, the unit patterns of the etching mask pattern 13 a may bedisposed such that six unit patterns surround a single unit pattern in ahexagonal arrangement.

With the etching mask pattern 13 a as a mask, the substrate 10 may besubjected to etching to form a convex-concave pattern 10 a includingconcavities 10 ac and convexities 10 av on an upper surface of thesubstrate 10. The substrate 10 may be etched by wet etching.

An etching solution used for wet etching may exhibit significantlydifferent etching rates dependent upon a crystal direction of thesubstrate 10. In other words, the etching solution may preferentiallyetch the substrate 10 in a specific crystal direction. By way ofexample, when the substrate 10 is a sapphire substrate or a GaNsubstrate, the etching solution may be a mixture of sulfuric acid andphosphoric acid, a mixture of nitric acid and phosphoric acid, or a KOHsolution. When the substrate 10 is a SiC substrate, the etching solutionmay be a BOE (buffered oxide etchant) or HF solution, and when thesubstrate 10 is a Si substrate, the etching solution may be a KOHsolution. By way of example, when the substrate 10 is a c-plane sapphiresubstrate and the etching solution is a mixture solution of sulfuricacid and phosphoric acid in a volume ratio of 3:1, the c-plane may bepreferentially etched in the course of wet etching.

Referring to FIG. 16B, the upper surfaces of the convexities 10 av areexposed by removing the etching mask pattern 13 a. The upper surfaces Tof the convexities 10 av may be planar surfaces, and facets S thereofmay have a first inclined angle θ1 relative to the surface of thesubstrate. Such facets may be first crystal planes. In addition, theangles of the facets S of the convexities 10 av inclined relative to thesurface of the substrate, that is, sloped angles of the facets of theconvexities 10 av, may be identical or may be different dependent uponthe facets S thereof. Further, bottom surfaces of the concavities 10 acplaced between the convexities 10 av may be coplanar with the surface ofthe substrate.

With reference to FIG. 17, the convex-concave pattern will be describedin more detail. FIG. 16B is a cross-sectional view taken along line I-I′of FIG. 17.

Referring to FIG. 16B and FIG. 17, the convex-concave pattern 10 aincludes a plurality of convexities 10 av and a plurality of concavities10 ac defined by the convexities 10 av. The bottom surfaces of theconcavities 10 ac placed between convexities 10 av and the uppersurfaces of the convexities 10 av may be planes that are substantiallyparallel to the surface of the substrate, for example, c-planes.Although the convexities may have a stripe shape or an island shapecorresponding to the shape of the etching mask pattern 13 a describedwith reference to FIG. 8 to FIG. 10, the etching mask pattern 13 a mayalso have a circular or polygonal island shape. In this case,particularly, when the etching mask pattern 13 a has a circular islandshape, the bottom surfaces of the convexities 10 av defined by sidesurfaces thereof may have a quasi-triangular shape, each side of whichbulges outwards, as shown in FIG. 17. Further, the upper surfaces of theconvexities 10 av may have a circular shape corresponding to the shapeof the etching mask pattern 13 a.

Referring to FIG. 16C, a buffer layer 21 may be formed on the substratehaving the convex-concave pattern 10 a formed thereon. Here, the bufferlayer 21 may be preferentially grown in a vertical direction on thebottom surfaces of the concavities 10 ac and the upper surfaces of theconvexities 10 av, which are parallel to the surface of the substrate.Further, since the bottom surfaces of the concavities 10 ac and thefacets S of the convexities 10 av are stable crystal planes formed bywet etching, there is a low possibility that dislocations will be formedis thereon. Accordingly, the light emitting diode may have improvedcrystal quality.

Next, the process is performed in the manner as described with referenceto FIG. 7F and FIG. 7J, thereby preparing a light emitting diode asshown in FIG. 16D.

FIG. 18A, FIG. 18B, FIG. 18C, and FIG. 18D are sectional viewsillustrating a method of fabricating a light emitting diode according toan exemplary embodiment of the present invention. The method offabricating a light emitting diode according to the present exemplaryembodiment may be similar to the fabrication method described withreference to FIG. 7A to FIG. 7J except for the following features.

Referring to FIG. 18A, an etching mask pattern 13 a is formed on asubstrate 10. The etching mask pattern 13 a may be formed by a processsimilar to the process described with reference to FIG. 7A and FIG. 7B.

With the etching mask pattern 13 a as a mask, the substrate 10 issubjected to etching to form a convex-concave pattern 10 a includingconcavities 10 ac and convexities 10 av on an upper surface of thesubstrate 10. The substrate 10 may be etched by wet etching.

An etching solution used for wet etching may exhibit significantlydifferent etching rates dependent upon a crystal direction of thesubstrate 10. In other words, the etching solution may preferentiallyetch the substrate 10 in a specific crystal direction. By way ofexample, when the substrate 10 is a sapphire substrate or a GaNsubstrate, the etching solution may be a mixture of sulfuric acid andphosphoric acid, a mixture of nitric acid and phosphoric acid, or a KOHsolution. When the substrate 10 is a SiC substrate, the etching solutionmay be a BOE (buffered oxide etchant) or HF solution, and when thesubstrate 10 is a Si substrate, the etching solution may be a KOHsolution. By way of example, when the substrate 10 is a c-plane sapphiresubstrate and the etching solution is a mixture solution of sulfuricacid and phosphoric acid in a volume ratio of 3:1, the c-plane may bepreferentially etched in the course of wet etching. Upper surfaces ofthe convexities 10 av may be planar surfaces, and facets S thereof mayhave a first inclined angle θ1 relative to the surface of the substrate.Such facets may be first crystal planes. In addition, the angles of thefacets S of the convexities 10 av inclined relative to the surface ofthe substrate, that is, sloped angles of the facets of the convexities10 av, may be identical or may be different dependent upon the facets Sthereof. Further, the upper surfaces of the convexities 10 av and thebottom surfaces of the concavities 10 ac placed between the convexities10 av may be substantially parallel to the surface of the substrate.

Referring to FIG. 18B, the substrate 10 having the convex-concavepattern 10 a is subjected to secondary etching using the etching maskpattern 13 a as a mask. Secondary etching may be dry etching,specifically, anisotropic etching. In this process, the side surfaces ofthe convexities 10 av and the bottom surfaces of the concavities 10 acmay be etched to a predetermined depth.

Referring to FIG. 18C, the upper surfaces T of the convexities 10 av areexposed by removing the etching mask pattern 13 a. The convexities 10 avhave upper facets, that is, first facets S1, and lower facets, that is,second facets S2, which have different inclined angles. Specifically,the first facets Si adjacent the upper surfaces T of the convexities 10av may be substantially perpendicular to the surface of the substrate,and the second facets S2 adjacent the concavities 10 ac may have a firstinclined angle θ1 (FIG. 18A) relative to the surface of the substrate,or a similar inclined angle to the first inclined angle.

Next, the process is performed in the manner as described with referenceto FIG. 7F and FIG. 7J, thereby preparing a light emitting diode asshown in FIG. 18D.

FIG. 19A, FIG. 19B, FIG. 19C, and FIG. 19D are sectional viewsillustrating a method of fabricating a light emitting diode according toan exemplary embodiment of the present invention. The method offabricating a light emitting diode according to the present exemplaryembodiment may be similar to the fabrication method described withreference to FIG. 7A to FIG. 7J except for the following features.

Referring to FIG. 19A, an etching mask pattern 13 a is formed on asubstrate 10. The etching mask pattern 13 a may be formed by a processsimilar to the process described with reference to FIG. 7A and FIG. 7B.

With the etching mask pattern 13 a as a mask, the substrate 10 may besubjected to etching to form a convex-concave pattern 10 a includingconcavities 10 ac and convexities 10 av on an upper surface of thesubstrate 10. The substrate 10 may be etched by dry etching,specifically, anisotropic etching. In this case, the facets of theconvexities 10 av may be substantially perpendicular to the surface ofthe substrate.

Referring to FIG. 19B, the substrate 10 having the convex-concavepattern 10 a is subjected to secondary etching using the etching maskpattern 13 a as a mask. Secondary etching may be wet etching. An etchingsolution used for wet etching may exhibit significantly differentetching rates dependent upon a crystal direction of the substrate 10. Inother words, the etching solution may preferentially etch the substrate10 in a specific crystal direction. By way of example, when thesubstrate 10 is a sapphire substrate or a GaN substrate, the etchingsolution may be a mixture of sulfuric acid and phosphoric acid, amixture of nitric acid and phosphoric acid, or a KOH solution. When thesubstrate 10 is a SiC substrate, the etching solution may be a BOE(buffered oxide etchant) or HF solution, and when the substrate 10 is aSi substrate, the etching solution may be a KOH solution. By way ofexample, when the substrate 10 is a c-plane sapphire substrate and theetching solution is a mixture solution of sulfuric acid and phosphoricacid in a volume ratio of 3:1, the c-plane may be preferentially etchedin the course of wet etching.

Referring to FIG. 19C, the upper surfaces T of the convexities 10 av areexposed by removing the etching mask pattern 13 a. The convexities 10 avhave upper facets, that is, first facets S1, and lower facets, that is,second facets S2, which have different inclined angles. The secondfacets S2 are formed by a specific crystal plane preferentially etchedin the course of wet etching and may have a predetermined inclined anglerelative to the surface of the substrate. The second facets S1 mayinclude upper facets and lower facets formed adjacent the upper surfacesT of the convexities 10 av and the bottom surfaces of the concavities 10ac. In addition, middle facets placed between the second facets S2 maybe substantially perpendicular to the surface of the substrate.

Next, the process is performed in the manner as described with referenceto FIG. 7F and FIG. 7J, thereby preparing a light emitting diode asshown in FIG. 19D.

CONVEX-CONCAVE PATTERN PREPARATION EXAMPLE 1

After a silicon oxide layer was formed on a c-plane sapphire substrate,a photoresist pattern was formed on the silicon oxide layer. Thephotoresist pattern was an array of unit patterns having a circularshape as shown in FIG. 9. The silicon oxide layer was subjected tohydrofluoric acid etching using the photoresist pattern as a mask toform a silicon oxide pattern. Next, the photoresist pattern was removed.With the silicon oxide pattern as a mask, the substrate was etched usinga mixture of sulfuric acid and phosphoric acid mixed in a volume ratioof 3:1. Next, a convex-concave pattern including convexities andconcavities, both of which have planar upper surfaces, was formed byremoving the silicon oxide pattern.

CONVEX-CONCAVE PATTERN PREPARATION EXAMPLE 2

A convex-concave pattern was formed on an upper surface of a substratein a similar manner as in Convex-concave Pattern Preparation Example 1except that the substrate was subjected to dry etching using a siliconoxide layer as a mask.

CONVEX-CONCAVE PATTERN PREPARATION EXAMPLE 3

The substrate obtained in Convex-concave Pattern Preparation Example 1was subjected to secondary etching using a mixture of sulfuric acid andphosphoric acid mixed in a volume ratio of 3:1.

CONVEX-CONCAVE PATTERN PREPARATION EXAMPLE 4

A 10 nm thick nickel layer was formed on the convex-concave pattern asprepared in Convex-concave Pattern Preparation Example 2, followed byheat treatment to form nickel clusters on the convex-concave pattern.After the convex-concave pattern was subjected to plasma etching usingthe nickel clusters as a mask, the nickel clusters were removed.

LIGHT EMITTING DIODE PREPARATION EXAMPLE 1

On a substrate having the convex-concave pattern prepared inConvex-concave Pattern Preparation Example 1, an undoped GaN layer wasformed by MOCVD. On the undoped GaN layer, an n-type GaN layer wasformed, and an active layer having a multi-quantum well structure ofInGaN/GaN was formed on the n-type GaN layer. Next, a p-type GaN layerwas formed on the active layer, followed by forming a mesa-etched regionthrough which the n-type GaN layer was exposed. Next, an ITO layer wasformed on the p-type GaN layer, and an n-type electrode and a p-typeelectrode were formed on the n-type GaN layer exposed in the mesa-etchedregion and the ITO layer, respectively.

LIGHT EMITTING DIODE PREPARATION EXAMPLE 2

A light emitting diode was prepared in a similar manner as in LightEmitting Diode Preparation Example 1 except that a substrate as preparedin Convex-concave Pattern Preparation Example 2 was used.

LIGHT EMITTING DIODE PREPARATION EXAMPLE 3

A light emitting diode was prepared in a similar manner as in LightEmitting Diode Preparation Example 1 except that a substrate as preparedin Convex-concave Pattern Preparation Example 3 was used.

FIG. 20 and FIG. 21 are cross-sectional SEM images of convex-concavepatterns after growing an epitaxial layer on the convex-concave patternsprepared in Convex-concave Pattern Preparation Examples 1 and 2.

Referring to FIG. 20 and FIG. 21, it can be seen that, when theconvex-concave pattern was formed by dry etching, not only didcrystallographic mismatch such as fine voids (VD) occur at an interfacebetween inclined planes of the convex-concave pattern and an epitaxiallayer 121, but also dislocation D occurred in the epitaxial layer 121(Convex-concave Pattern Preparation Example 2, FIG. 21). On the otherhand, when the convex-concave pattern 10 a was formed by wet etching,neither fine voids at the interface between inclined planes of aconvex-concave pattern 10 a and an epitaxial layer 21 nor dislocationwere observed. Thus, it can be seen that the crystal quality was good(Convex-concave Pattern Preparation Example 1, FIG. 20).

In ESD testing of the light emitting diodes prepared in Light EmittingDiode Preparation Examples 1 and 2, the light emitting diodes ofPreparation Example 1 had an ESD yield of 71.07% (here, the term “ESDyield” means a ratio of light emitting diodes normally operated to atotal number of light emitting diodes, when a constant voltage of 1 kVwas applied three times to a plurality of light emitting diodes),whereas the light emitting diodes of Preparation Example 2 had an ESDyield of 0.33%. It is considered that this result was derived from thefact that the light emitting diode (Preparation Example 1) having theconvex-concave pattern (Convex-concave Pattern Preparation Example 1)formed by wet etching had better crystal quality than the light emittingdiode (Preparation Example 2) having the convex-concave pattern(Convex-concave Pattern Preparation Example 2) formed by dry etching.

FIG. 22A, FIG. 22B, and FIG. 22C are SEM images of a substrate having aconvex-concave pattern prepared in Convex-Concave Pattern PreparationExample 4.

Referring to FIG. 22A to FIG. 22C, a convex-concave pattern 10 a havingconvexities 10 av and concavities 10 ac defined thereby is formed on anupper surface of a substrate. Each of the convexities 10 av includeslower facets LF and upper facets UF, and an upper vertex V formed wherethe upper facets UF meet. An angle (θ2) defined between the upper facetsUF and the surface of the substrate is smaller than an angle (θ1)defined between the lower facets LF and the surface of the substrate.

In addition, a bottom surface defined by the lower facets LF of theconvexity 10 av has a quasi-triangular shape, each side of which bulgesoutwards. Further, the upper facets UF of the convexity 10 av provide agenerally hexagonal shape in top view.

FIG. 23 is a graph depicting current output of light emitting diodesprepared in Light Emitting Diode Preparation Examples 2 and 3.

Referring to FIG. 23, it can be seen that the light emitting diode ofPreparation Example 3 efficiently prevented efficiency droop in a highcurrent range as compared with the light emitting diode of PreparationExample 2. Thus, the light emitting diode of Preparation Example 3,which includes the convex-concave pattern (Convex-concave PatternPreparation Example 3) formed by secondary wet etching had improvedepitaxial crystal quality as compared with the light emitting diode ofPreparation Example 2, which includes the convex-concave pattern(Convex-concave Pattern Preparation Example 2) formed by dry etching.

FIG. 24A and FIG. 24B are SEM images of a substrate having aconvex-concave pattern prepared in Convex-Concave Pattern PreparationExample 4.

Referring to FIG. 24A and FIG. 24B, it can be seen that a plurality offine convexities and concavities P was formed on surfaces of convexities10 av and concavities 10 ac of a convex-concave pattern 10 a. Such fineconvexities and concavities P cause diffuse reflection of light emittedfrom the active layer, thereby improving light extraction efficiency.

According to exemplary embodiments of the present invention, a lightemitting diode includes parallelogram-shaped light emitting units ortriangular light emitting units having three acute angles to reduceoptical loss occurring at side surfaces of the light emitting units,thereby improving light extraction efficiency. In addition, aconvex-concave pattern having fine convexities and concavities is formedin a region of a substrate between the light emitting units, therebyimproving light extraction efficiency.

Although the invention has been illustrated with reference to someexemplary embodiments in conjunction with the drawings, it will beapparent to those skilled in the art that various modifications andchanges can be made to the invention without departing from the spiritand scope of the invention. Further, it should be understood that somefeatures of a certain exemplary embodiment may also be applied to otherexemplary embodiments without departing from the spirit and scope of theinvention. Therefore, it should be understood that the exemplaryembodiments are provided by way of illustration only and are given toprovide complete disclosure of the invention and to provide thoroughunderstanding of the invention to those skilled in the art. Thus, it isintended that the invention cover the modifications and variationsprovided they fall within the scope of the appended claims and theirequivalents.

What is claimed is:
 1. A light emitting diode, comprising: a substratecomprising a concave-convex pattern having concave portions and convexportions; a first light emitting unit disposed on the substrate; asecond light emitting unit disposed on the substrate; a first wireconnecting the first light emitting unit to the second light emittingunit over the concave-convex pattern; and an insulation layer disposedbetween the concave-convex pattern and the wire, wherein the insulationlayer has a shape corresponding to the concave-convex pattern.
 2. Thelight emitting diode of claim 1, wherein the first wire extends from acorner of the first light emitting unit toward a plane of the secondlight emitting unit.
 3. The light emitting diode of claim 1, wherein thesubstrate further comprises fine convexities and concavities in a regionof the concave-convex pattern.
 4. The light emitting diode of claim 3,wherein the region of the concave-convex pattern having the fineconvexities and concavities is between the first and second lightemitting units such that the first wire extends over the portion of theconcave-convex pattern having the fine convexities and concavities. 5.The light emitting diode of claim 3, wherein the region of theconcave-convex pattern having the fine convexities and concavitiesvertically corresponds to mesa-etched regions of the first and secondlight emitting units.
 6. The light emitting diode of claim 1, whereinthe first light emitting unit is a first parallelogram-shaped lightemitting unit having two acute angles and two obtuse angles, and whereinthe second light emitting unit is a second parallelogram-shaped lightemitting unit having two acute angles and two obtuse angles.
 7. Thelight emitting diode of claim 3, wherein the region of theconcave-convex pattern having the fine convexities and concavitiescorresponds to an isolation groove isolating the first light emittingunit from the second light emitting unit.
 8. The light emitting diode ofclaim 1, further comprising: a third light emitting unit disposed on thesubstrate; and a second wire connecting the second light emitting unitto the third light emitting unit, wherein the third light emitting unitis a triangular-shaped light emitting unit.
 9. The light emitting diodeof claim 1, further comprising: at least one additional first lightemitting unit disposed on the substrate, each of the first lightemitting unit and the at least one additional first light emitting unithaving a first triangular shape with three acute angles; at least oneadditional second light emitting unit disposed on the substrate, each ofthe second light emitting unit and at least one additional second lightemitting unit having an obtuse angle; at least one second wireconnecting the first light emitting unit and the at least one additionalfirst light emitting unit to each other; and at least one additionalfirst wire connecting the at least one additional first light emittingunit to the at least one additional second light emitting unit.
 10. Thelight emitting diode of claim 9, wherein the first light emitting unitand the at least one additional first light emitting unit comprise sixtriangular light emitting units radially arranged about an imaginarypoint.
 11. The light emitting diode of claim 10, wherein the imaginarypoint is disposed at the center of the light emitting diode.
 12. Thelight emitting diode of claim 11, wherein the six triangular lightemitting units are arranged in a mirror symmetrical structure relativeto a vertical plane passing through the imaginary point.
 13. The lightemitting diode of claim 12, wherein each of the second light emittingunit and the at least one additional second light emitting unit has apentagonal shape.
 14. The light emitting diode of claim 9, furthercomprising: a first electrode pad and a second electrode pad, whereinthe first light emitting unit, the at least one additional first lightemitting unit, the second light emitting unit, and the at least oneadditional second light emitting unit form two serial arrays connectedin parallel to each other between the first electrode pad and the secondelectrode pad.